Process for producing high purity silica

Details Process for producing high purity silica Process for producing high purity silica

1989-11-09

1990-11-27

Russel, Jeffrey E.

Chemistry of inorganic compounds

Silicon or compound thereof

Oxygen containing

423338, C01B 3312

Patent

active

049734628

ABSTRACT:
This invention concerns a process for producing high purity silica with less than 5 ppm of impurities from cheap alkali silicate aqueous solution (water glass) for industrial use, which commonly contains more than 2000 ppm of impurities, by directly adding water glass to a mineral acid solution, such as hydrochloric acid, nitric acid, and sulfuric acid so as to dissolve impurities in the mineral acid solution and form silica precipitate, and then rinsing the silica precipitate with a mineral acid solution, provided that the viscosity of the water glass is adjusted to 10-10000 poise in advance of adding to the mineral acid solution.

REFERENCES:
patent: 4067746 (1978-01-01), Wason et al.
patent: 4190632 (1980-02-01), Achenbach et al.
patent: 4321243 (1982-03-01), Cornwell et al.
patent: 4465657 (1984-08-01), Spijker et al.
patent: 4505883 (1985-03-01), Vite et al.
patent: 4683128 (1987-07-01), Orii et al.
Bunseki '88 9, Japan Society for Analytical Chemistry, pp. 639-646, Sep. 1988 (partial translation).

Affiliated with

Also associated with

Rating

Process for producing high purity silica does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for producing high purity silica, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing high purity silica will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1031158