Chemistry of inorganic compounds – Hydrogen or compound thereof – Elemental hydrogen
Reexamination Certificate
2006-05-02
2006-05-02
Langel, Wayne A. (Department: 1754)
Chemistry of inorganic compounds
Hydrogen or compound thereof
Elemental hydrogen
C423S657000, C423S658000
Reexamination Certificate
active
07037483
ABSTRACT:
To produce high-pressure hydrogen, water and a hydrogen-generating material (MgH2) which reacts with water to generate hydrogen are weighed so that a target high hydrogen pressure is generated in a high-pressure container. Then, the hydrogen-generating material is introduced into the high-pressure container through its supply port, and water is introduced into the high-pressure container through the supply port. Thereafter, the supply port is closed, thereby causing a reaction between the hydrogen-generating material and the water, so that the hydrogen pressure in the high-pressure container reaches a target high hydrogen pressure.
REFERENCES:
patent: 3932600 (1976-01-01), Gutbier et al.
patent: 3957483 (1976-05-01), Suzuki
patent: 4950460 (1990-08-01), Goodwin et al.
patent: 6184432 (2001-02-01), Thomas
patent: 6506360 (2003-01-01), Andersen et al.
patent: 6638493 (2003-10-01), Andersen et al.
patent: 6899862 (2005-05-01), Baldwin et al.
patent: 2002/0048548 (2002-04-01), Chaklader
patent: 2004/0131541 (2004-07-01), Andersen
patent: 9-266006 (1999-10-01), None
patent: 11-283633 (1999-10-01), None
Hosoe Mitsuya
Isobe Takeaki
Kanoya Izuru
Suzuki Takanori
Arent & Fox PLLC
Honda Giken Kogyo Kabushiki Kaisha
Langel Wayne A.
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