Process for producing halftone mask

Details Process for producing halftone mask Process for producing halftone mask

1999-08-11

2000-12-19

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430296, 430320, 430942, G03F 900

Patent

active

061625671

ABSTRACT:
A process for producing a halftone mask comprises the steps of: (a) forming an electron beam resist film on a mask blank which includes a translucent film and a light-block film sequentially formed on a transparent substrate; (b) irradiating an electron beam to the electron beam resist film in such a dose that the electron beam resist film remains in a predetermined thickness by development in a first write area and is completely removed by development in a second write area; (c) developing the electron beam resist film thereby to form an electron beam resist film retaining the predetermined thickness in the first write area and having an opening in the second write area; (d) patterning the light-block film using the resulting electron beam resist film as a mask; (e) ashing the electron beam resist film to remove the electron beam resist film from the first write area completely; (f) patterning the translucent film using the patterned light-block film as a mask; and (g) patterning the light-block film using the resulting electron beam resist film as a mask.

Affiliated with

Also associated with

Rating

Process for producing halftone mask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for producing halftone mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing halftone mask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-269760