Etching a substrate: processes – Nongaseous phase etching of substrate – Using film of etchant between a stationary surface and a...
Reexamination Certificate
2006-07-04
2006-07-04
Ahmed, Shamim (Department: 1765)
Etching a substrate: processes
Nongaseous phase etching of substrate
Using film of etchant between a stationary surface and a...
C216S022000, C216S031000, C216S088000, C451S041000, C451S285000, C451S287000, C451S290000
Reexamination Certificate
active
07070703
ABSTRACT:
A polished glass disk is prepared for a magnetically recordable coating by texturing the surfaces with a highly abrasive material being abrasively engaged with the surfaces as the disk is rotated, thereby creating a relatively coarse texture with the abrasions concentric with the axis of rotation of the disk. Thereafter, the roughness of the texturing is reduced by abrading the surface of the disk with a polishing pad and an etchant slurry of colloidal silica. The etchant component has the property of attacking or softening the glass disk during the fine polishing with the colloidal silica slurry. As both the texturing step and the fine polishing step deposit a plurality of concentric abrasions on a glass disk, these abrasions aid in retaining the magnetically recordable coating deposited thereon to complete a magnetically recordable disk for use as a data storage member.
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Co-pending patent application “Self Cleaning Colloidal Slurry Composition and Process for Finishing a Surface of a Substrate”; U.S. Appl. No. 09/976,167; Filed: Oct. 12, 2001.
Benning Frederick P.
Maynard Steven L.
Paurus David C.
Podolske Jon Edward
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