Chemistry of inorganic compounds – Halogen or compound thereof – Elemental halogen
Reexamination Certificate
2005-09-22
2009-08-11
Nguyen, Ngoc-Yen M (Department: 1793)
Chemistry of inorganic compounds
Halogen or compound thereof
Elemental halogen
C423S503000, C423S504000, C137S338000, C137S003000, C137S896000, C137S341000, C422S198000, C422S238000, C422S239000, C422S236000
Reexamination Certificate
active
07572428
ABSTRACT:
A process for producing a fluorine gas of the invention comprises a step (1) of generating a fluorine gas by sectioning the interior of a fluorine gas generation container equipped with a heating means, by the use of a structure having gas permeability, then filling each section with a high-valence metal fluoride and heating the high-valence metal fluoride. The process may comprise a step (2) of allowing the high-valence metal fluoride, from which a fluorine gas has been generated in the step (1), to occlude a fluorine gas. According to the process of the invention, a high-purity fluorine gas that is employable as an etching gas or a cleaning gas in the process for manufacturing semiconductors or liquid crystals can be produced inexpensively on a mass scale.
REFERENCES:
patent: 4284617 (1981-08-01), Bowen et al.
patent: 4506140 (1985-03-01), Armstrong
patent: 5363396 (1994-11-01), Webb et al.
patent: 6609540 (2003-08-01), Torisu et al.
patent: 6955801 (2005-10-01), Torisu et al.
patent: 2004/0028600 (2004-02-01), Torisu et al.
patent: 1 357 103 (2003-10-01), None
patent: 5-502981 (1993-05-01), None
patent: 2003-081614 (2003-03-01), None
patent: 1432001 (1988-10-01), None
patent: WO 2004/056700 (2004-07-01), None
Fukuyo Tomoyuki
Oka Masakazu
Torisu Junichi
Nguyen Ngoc-Yen M
Showa Denko K.K.
Sughrue & Mion, PLLC
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