Process for producing epoxide compound

Organic compounds -- part of the class 532-570 series – Organic compounds – Heterocyclic carbon compounds containing a hetero ring...

Reexamination Certificate

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C502S159000, C502S160000, C502S164000

Reexamination Certificate

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07074947

ABSTRACT:
A process for producing an epoxide compound, characterized by reacting an olefin compound with hydrogen peroxide in the presence of: a metal oxide catalyst obtained by reacting hydrogen peroxide with at least one member selected from the group consisting of tungsten metal, molybdenum metal, compounds of tungsten and a Group IIIb, IVb, Vb, or VIb element, tungstic acid and salts thereof, compounds of molybdenum and a Group IIIb, IVb, Vb, or VIb element, and molybodic acid and salts thereof; at least one member selected from the group consisting of tertiary amine compounds, tertiary amine oxide compounds, nitrogenous aromatic compounds, and nitrogenous aromatic N-oxide compounds; and a phosphoric acid compound.

REFERENCES:
patent: 4562276 (1985-12-01), Venturello et al.
patent: 4595671 (1986-06-01), Venturello et al.
patent: 5086189 (1992-02-01), Lecloux et al.
patent: 5274140 (1993-12-01), Venturello et al.
patent: 5367032 (1994-11-01), Hancock et al.
patent: 5780655 (1998-07-01), Shum
patent: 6054407 (2000-04-01), Schulz et al.
patent: 3-236381 (1991-10-01), None
patent: 11-349579 (1999-12-01), None
patent: 2002-201147 (2002-07-01), None

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