Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component
Patent
1991-04-01
1992-06-30
Niebling, John
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Halogenous component
423241, 423DIG20, 423488, C01B 707
Patent
active
051261197
ABSTRACT:
A process for producing a chlorine-free hydrochloric acid low in AOX from crude gases containing hydrogen chloride and organic impurities has been found. The crude gases wer subjected to a thermal treatment at 800.degree. to 1600.degree. in a reducing atmosphere. The hydrochloric acid obtained after absorption of the hydrogen chloride is chlorine-free and contains virtually no organic impurities. The waste gas is also chlorine-free.
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Freyer Walter
Olffers Theo
Bolam Brian M.
Hoechst Aktiengesellschaft
Niebling John
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