Process for producing cathodes for cathodic sputtering based on

Details Process for producing cathodes for cathodic sputtering based on Process for producing cathodes for cathodic sputtering based on

1991-07-09

1992-11-03

Dean, R.

Metal treatment

Process of modifying or maintaining internal physical...

With casting or solidifying from melt

148437, 148695, 148698, 20429813, C22F 104, C23C 1400

Patent

active

051603888

ABSTRACT:
The invention relates to a process for the production of targets to be used in the vacuum deposition of aluminium alloy by cathodic sputtering.
The process consists of a heat treatment of the aluminium alloy disks making it possible to obtain a fine grain. It is characterized by the dissolving of the silicon, followed by controlled cooling bringing about the fine precipitation of the silicon and an optional silicon spheroidization treatment. After cooling, the disks are deformed with the press and undergo a final recrystallization treatment.
The process is applied to the production of targets or cathodes for the coating of semiconductor silicon wafers by cathodic sputtering.

REFERENCES:
patent: 4797164 (1989-01-01), Hollrigl et al.

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