Process for producing ascorbic acid derivative

Details Process for producing ascorbic acid derivative Process for producing ascorbic acid derivative

1995-04-18

1996-05-14

Dentz, Bernard

Organic compounds -- part of the class 532-570 series

Organic compounds

Heterocyclic carbon compounds containing a hetero ring...

549316, 549317, C07F 9655, C07D30762

Patent

active

055169198

ABSTRACT:
Metal salts or substitutted or non-substituted ammonium salts of ascorbic acid derivatives can be produced in high yield by treating an acidic aqueous solution containing ascorbic acid-2-phosphate or ascorbic acid-2-sulfate with a porous adsorbent such as activated carbon, followed by treating the adsorbent with a basic aqueous solution containing e.g. a metal salt of an organic acid or substituted or non-substituted ammonium salt ion to elute the desired salt of ascorbic acid derivative.

REFERENCES:
patent: 4070377 (1978-01-01), Hayashi et al.
patent: 4071534 (1978-01-01), Hayashi et al.
patent: 4724262 (1988-02-01), Shimbo et al.
patent: 5118817 (1992-06-01), Yoshida et al.
patent: 5212079 (1993-05-01), Fujio et al.
Chemical Abstracts vol. 86-95999 (1976); abstract of Spanish ES 425,881, Jul. 1, 1976.
Nomura et al., Chem. Pharm. Bull., 17(2), pp. 381-386 (1969).
Derwent Publication--Abstract of JP A 63-077890 (1988).
Derwent Publication--Abstract of JP A 62-103096 (1987).
Derwent Publication--Abstract of JP B 84-4438 (1984).
Derwent Publication--Abstract of JP B 68-9219 (1968).
Derwent Publication--Abstract of JP A 51-11757 (1976).
Derwent Publication--Abstract of JP A 50-59363 (1975).

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