Etching a substrate: processes – Forming or treating an article whose final configuration has...
Reexamination Certificate
2005-12-27
2005-12-27
Ahmed, Shamim (Department: 1765)
Etching a substrate: processes
Forming or treating an article whose final configuration has...
C216S002000, C216S099000, C438S745000, C438S753000, C250S306000, C073S105000
Reexamination Certificate
active
06979407
ABSTRACT:
Process for producing an SPM sensor having a holding element, a cantilever and a sensor tip which projects out of the surface of the cantilever and is delimited by three surfaces. According to the process, the starting material used is a (100)-silicon wafer. The main patterning process steps are carried out on the wafer back surface, so that an SPM sensor can be produced at low cost in a single batch run.
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Ahmed Shamim
Bachman & LaPointe P.C.
Nanoworld AG
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