Process for producing an SPM sensor

Etching a substrate: processes – Forming or treating an article whose final configuration has...

Reexamination Certificate

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C216S002000, C216S099000, C438S745000, C438S753000, C250S306000, C073S105000

Reexamination Certificate

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06979407

ABSTRACT:
Process for producing an SPM sensor having a holding element, a cantilever and a sensor tip which projects out of the surface of the cantilever and is delimited by three surfaces. According to the process, the starting material used is a (100)-silicon wafer. The main patterning process steps are carried out on the wafer back surface, so that an SPM sensor can be produced at low cost in a single batch run.

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