Process for producing an organic photosensitive material prevent

Details Process for producing an organic photosensitive material prevent Process for producing an organic photosensitive material prevent

1994-01-27

1995-07-11

Martin, Roland

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Process of making radiation-sensitive product

430134, G03G 506

Patent

active

054320380

ABSTRACT:
A process for producing an organic photosensitive material preventing brushing by applying an organic solvent solution or a dispersion of an organic photosensitive material onto the surface of a blank tube consisting of an electrically conducting substrate such as of aluminum, wherein when the thickness of the blank tube is denoted as t (cm) and the thickness of the photosensitive material layer as d (cm), the thickness of said photosensitive material layer is so set as to satisfy the following equation, d=kt, wherein k is a number which is 0.13 or smaller. The brushing can be effectively prevented by controlling only the thickness of the blank tube which is forming the photosensitive layer and the thickness of said photosensitive layer.

REFERENCES:
patent: 3849128 (1974-11-01), Ihara
patent: 3956524 (1976-05-01), Weigl
patent: 4481273 (1984-11-01), Katagiri et al.
patent: 4963453 (1990-10-01), Kinoshita
patent: 5120627 (1992-06-01), Nozomi et al.
Hackh's Chemical Dictionary, 1969, p. 104.
Patent Abstracts of Japan, vol. 7, No. 10 (P-168) (Jan. 14, 1983).
Patent Abstracts of Japan, vol. 14, No. 498 (P-1124) (Oct. 30, 1990).
Patent Abstracts of Japan, vol. 10, No. 132 (P-456) (May 16, 1986).

Affiliated with

Also associated with

Rating

Process for producing an organic photosensitive material prevent does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for producing an organic photosensitive material prevent, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing an organic photosensitive material prevent will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-502546