Process for producing an integrated electronic circuit...

Details Process for producing an integrated electronic circuit... Process for producing an integrated electronic circuit...

2007-04-10

2007-04-10

Nhu, David (Department: 2818)

Semiconductor device manufacturing: process

Making passive device

Trench capacitor

C438S197000, C438S243000, C257SE21008, C257S008000, C257S646000, C257S651000

Reexamination Certificate

active

10850040

ABSTRACT:
A process for producing an integrated electronic circuit. The process begins with the production of a first electronic component and a second electronic component that are superposed on top of a substrate. A volume of temporary material is formed on the substrate at the position of the second electronic component. The first electronic component is then produced above the volume of temporary material relative to the substrate, and then the second electronic component is produced using at least one shaft for access to the temporary material. The first electronic component may be an active component and the second electronic component may be a passive component.

REFERENCES:
patent: 4888300 (1989-12-01), Burton
patent: 5438015 (1995-08-01), Lur
patent: 5658816 (1997-08-01), Rajeevakumar
patent: 5943581 (1999-08-01), Lu et al.
patent: 5972758 (1999-10-01), Liang
patent: 6127712 (2000-10-01), Wu
patent: 6245636 (2001-06-01), Maszara
patent: 6468877 (2002-10-01), Pradeep et al.
patent: 2004/0124468 (2004-07-01), Coronel et al.
French Preliminary Search Report dated Jan. 26, 2004 for French Application No. 03 06030.

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