Process for producing an improved quality electrolessly deposite

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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427 96, 427123, 4271262, 427305, 4273763, 4273833, 4273835, 427404, 4274192, B05D 512

Patent

active

044078609

ABSTRACT:
A method of providing a stress-free metal layer by electroless plating techniques, including the steps of (1) providing a substrate that includes some glass material in at least the surface areas to receive a metal layer, (2) depositing a layer of metal-boron by electroless plating techniques, and (3) heating the resultant metal-boron layer in a non-reacting and/or H.sub.2 environment at a temperature of at least 750.degree. C. for a time sufficient to diffuse the boron to the glass material in the substrate.

REFERENCES:
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patent: 3579375 (1971-05-01), Wonilowicz
patent: 3632436 (1972-01-01), Denning
patent: 3962143 (1976-06-01), Hitch et al.
patent: 4055706 (1977-10-01), Galmiche et al.
patent: 4245273 (1981-01-01), Feinberg et al.
patent: 4349585 (1982-09-01), Nagashima
Stelmak, IBM Tech. Dis. Bul., vol. 20, No. 7, Dec. 1977.
Haddad, IBM TDB, vol. 16, No. 4, Sep. 1973, p. 1282.
Haddad et al., IBM TDB, vol. 21, No. 6, Nov. 1978, p. 2316.
Harvilchuck et al., IBM TDB, vol. 19, No. 11, Apr. 1977, p. 4158.

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