Metal treatment – Process of modifying or maintaining internal physical... – Chemical-heat removing or burning of metal
Patent
1976-11-01
1977-11-01
Rutledge, L. Dewayne
Metal treatment
Process of modifying or maintaining internal physical...
Chemical-heat removing or burning of metal
29578, 29580, 357 49, 357 50, 357 54, H01L 2120, H01L 2176
Patent
active
040564142
ABSTRACT:
Thermoprocessing of integrated-circuit devices and ionizing radiation environments create electronic charges in dielectric isolation materials and in dielectric-semiconductor interface regions. These charges can produce serious alterations in the operating characteristics of the devices and integrated circuits. The deleterious effect of these charges may be greatly reduced by the disclosed process which produces a single-crystal silicon film dielectrically isolated from a polycrystalline silicon support by an underlying insulator of either silicon nitride or silicon dioxide, both of which may be grown by the process at selected locations on the same chip.
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patent: 3423255 (1969-01-01), Joyce
patent: 3738883 (1973-06-01), Bean et al.
patent: 3832247 (1974-08-01), Saddler et al.
patent: 3913121 (1975-10-01), Youmans et al.
patent: 4004046 (1977-01-01), Price
Fairchild Camera and Instrument Corporation
MacPherson Alan H.
Reitz Norman E.
Rutledge L. Dewayne
Saba W. G.
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