Process for producing an H2-CO gas mixture

Details Process for producing an H2-CO gas mixture Process for producing an H2-CO gas mixture

1998-12-28

2001-09-04

Griffin, Steven P. (Department: 1754)

Compositions

Gaseous compositions

Carbon-oxide and hydrogen containing

C423S650000, C423S652000

Reexamination Certificate

active

06284157

ABSTRACT:

BACKGROUND OF THE INVENTION
1. Field of the Invention
The invention is based on a process of producing an H
2
—CO gas mixture from an inlet gas which contains CH
4
—CO
2
gas mixture.
2. Discussion of Background
The present invention relates generally to the use of a discharge reactor, art as disclosed by WO 97/29833. In the latter, in order to efficiently obtain fuels and/or propellants from an undesired greenhouse gas, preferably from nitrogen or laughing gas, and a hydrogen-containing gas or vapor, these gases are subjected in a first reactor to a silent electrical discharge. This produces excited or ionized atoms and/or molecules which are converted in a catalytic reactor with a copper-containing first catalyst into H
2
and, where appropriate, CO. Through a relief valve, a liquid of a fuel and/or propellant precipitates in a liquid container. Gases escaping from the liquid container are fed through a thermal reactor with a second catalyst and relieved through a relief valve. In a downstream liquid container, CH
3
OH, for example, precipitates as the desired liquid propellant. Teaching as to what proportion of CO
2
in the inlet gas is required for the reactor in order to obtain a predeterminable synthesis gas volume ratio R=H
2
/CO at the output is not disclosed by this publication.
SUMMARY OF THE INVENTION
Accordingly, one object of the invention, is to provide a novel process for producing an H
2
—CO gas mixture of the type mentioned at the start, such that for predeterminable values of a synthesis gas volume ratio R=H
2
/CO, the proportion of CO
2
in the inlet gas needed for this can be specified.
One advantage of the invention consists in that synthesis gas can be obtained more effectively with desired compositions. When the inlet gases have the desired composition, less carbon is formed, which can precipitate as an undesirable conductive deposit in the reaction space of the discharge reactor or can destroy a catalyst possibly arranged therein. This advantage is particularly significant for a CO
2
proportion of >50% in the gas mixture. It has also been found advantageous to add water vapor to the inlet gas since this also contributes to reducing the formation of carbon.
A further advantage resides in the fact that the reaction temperature may be ≦100° C. The synthesis is substantially independent of the pressure of the inlet gases, their temperature and throughput.
By virtue of the production process, which can also be operated without a catalyst, electrical energy can be converted into chemical energy, stored and readily transported. The greenhouse gases used as input are available at low cost. The undesired CO
2
content in the air can be reduced.


REFERENCES:
patent: 4105755 (1978-08-01), Darnell et al.
patent: 4973453 (1990-11-01), Agee
patent: 5578647 (1996-11-01), Li et al.
patent: 5855815 (1999-01-01), Park et al.
patent: 6007742 (1998-08-01), Czernichowski et al.
patent: 6027617 (2000-02-01), Hayashi et al.
patent: 6136278 (2000-10-01), Eliasson et al.
patent: 1248624 (1967-08-01), None
patent: 0215930B1 (1990-06-01), None
patent: WO92/02448 (1992-02-01), None
patent: WO97/29833 (1997-08-01), None
“Kohle, Gaserzeugung”, Ullmanns Encyclopedie der Technischen Chemie, 1977, p. 398-399.

Affiliated with

Also associated with

Rating

Process for producing an H2-CO gas mixture does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for producing an H2-CO gas mixture, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing an H2-CO gas mixture will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2455119