Chemistry of carbon compounds – Miscellaneous organic carbon compounds – C-metal
Patent
1981-07-29
1982-12-21
Bascomb, Jr., Wilbur L.
Chemistry of carbon compounds
Miscellaneous organic carbon compounds
C-metal
203 61, 560114, 560204, 560232, 560248, B01D 336, C11C 312, C07C 6748
Patent
active
043648690
ABSTRACT:
A process for the production of alkyl esters of saturated aliphatic carboxylic acids by reacting in an alkoxycarbonylation stage olefins with carbon monoxide and alkanol in the presence of a catalyst consisting of a cobalt compound and a promoter from the group of pyridine, non-ortho-substituted alkylpyridine or mixtures thereof at elevated pressure and elevated temperature. The reaction mixture produced is reprocessed and the pyridine, non-ortho-substituted alkylpyridine, or mixture used as the promoter is rectified prior to its feedback into the alkoxycarbonylation stage in the presence of a given carboxylic acid which is thermally stable under the conditions of reprocessing and which forms a maximum azeotrope with the promoter under the conditions of rectification.
REFERENCES:
patent: 2412650 (1946-12-01), Riethof
patent: 2412651 (1946-12-01), Riethof
patent: 2511198 (1950-06-01), Engel
patent: 3507891 (1970-04-01), Hearne
patent: 3906016 (1975-09-01), Isa
patent: 4041057 (1977-08-01), Fanning
Peter Hofmann et al., "Hydrocarboxymethylation--An Attractive Route from Olefins to Fatty Acid Esters?" Sep. 1980, I and EC Product Research and Development, vol. 19, pp. 330-334.
Hofmann Peter
Muller Wolfgang H. E.
Bascomb, Jr. Wilbur L.
Chemische Werke Huls A.G.
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