Coating processes – Particles – flakes – or granules coated or encapsulated – Solid encapsulation process utilizing an emulsion or...
Patent
1994-03-21
1996-10-22
Lovering, Richard D.
Coating processes
Particles, flakes, or granules coated or encapsulated
Solid encapsulation process utilizing an emulsion or...
25218232, 252309, 252314, 427216, 42840224, 428403, B01J 1302, B32B 1502, C23C 816
Patent
active
055674747
ABSTRACT:
A process for producing alkali metal dispersions by agitating a mixture of molten alkali metal in a hydrocarbon oil at dispersion speeds by contacting the dispersed alkali metal with up to 3 weight percent anhydrous carbon dioxide through the agitating dispersion for at least 1 minute. The process produces lithium dispersions having a dispersion coating containing lithium carbonate, lithium oxide or hydroxide and a hydrocarbon.
REFERENCES:
patent: 2058503 (1936-10-01), Rafton et al.
patent: 2394608 (1946-02-01), Hansley
patent: 2798831 (1957-07-01), Willcox
patent: 2918435 (1959-12-01), Warner
patent: 2930712 (1960-03-01), Homer et al.
patent: 3197516 (1965-07-01), Esmay et al.
patent: 3580862 (1971-05-01), Watson et al.
patent: 4132666 (1979-01-01), Chikatsu et al.
patent: 4671211 (1987-06-01), Buford
Z. H. Kafafi, et al., J. Am. Chem. Soc., 105, 3886 (1983).
D. J. David, et al., in Applications of Surface Science, 7, (1981), 185-195.
P. A. Lindfors, et al., Microbeam Analysis, 303-308 (1981).
M. M. Markowitz, et al., in J. Chem. Eng'g. Data 7 (1962) 586-591.
Currin, Jr. R. Thomas
Dover B. Troy
Kamienski Conrad W.
Morrison Robert C.
Andersen Robert L.
Fellows Charles C.
FMC Corporation
Lovering Richard D.
LandOfFree
Process for producing alkali metal dispersions does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for producing alkali metal dispersions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing alkali metal dispersions will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2356897