Process for producing actively addressing substrate, and liquid

Details Process for producing actively addressing substrate, and liquid Process for producing actively addressing substrate, and liquid

1995-10-05

1999-03-23

Sikes, William L.

Liquid crystal cells, elements and systems

Particular structure

Having significant detail of cell structure only

349 43, 349110, G02F 1136, G02F 11333

Patent

active

058867619

ABSTRACT:
A photoresist 10 is exposed to light from behind a substrate by using as photomask a wiring electrodes 2 and 4 and a switching element 8 which are individually composed of an opaque member, whereby a passivation layer 9 for the switching element 8 is patterned. By virtue of this method, a photomask becomes unnecessary and jogs of the passivation layer 9 can be formed outside the transparent pixel electrode 7. Therefore, an unsatisfactory orientation of a liquid crystal can be made invisible without enlarging the black matrix of a counter substrate. Furthermore, since a passivation layer can be removed in portions not requiring the passivation layer, image-sticking can be reduced and the quality of displayed picture can be greatly improved. The present invention makes it possible to reduce the number of photomasks used for production of an actively addressing substrate and improve the picture quality of a liquid crystal display.

REFERENCES:
patent: 5124823 (1992-06-01), Kawasaki et al.
patent: 5196721 (1993-03-01), Miyake et al.
patent: 5289016 (1994-02-01), Noguchi

Affiliated with

Also associated with

Rating

Process for producing actively addressing substrate, and liquid does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for producing actively addressing substrate, and liquid , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing actively addressing substrate, and liquid will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2131594