Process for producing a thin film with MEMS probe circuits

Details Process for producing a thin film with MEMS probe circuits Process for producing a thin film with MEMS probe circuits

2008-04-01

2008-04-01

Lindsay, Jr., Walter (Department: 2812)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

C438S052000, C438S053000, C438S054000, C438S055000, C257SE29273

Reexamination Certificate

active

07351602

ABSTRACT:
A process for producing a thin film with MEMS probe circuits by using semiconductor process technology comprises steps of providing a flatted process substrate; forming a separable interface on the flatted process substrate; forming a probe circuit thin film with electric circuits, probes and circuit contacts on the separable interface; forming a raised probe supported-spacer on the probe circuit thin film; separating the probe circuit thin film from the process substrate; and processing a subsequent microstructure working to obtain a thin film with MEMS probe circuits which use the raised probe supported-spacer to form a buffer to prevent the probes from being exposed to much pressure.

REFERENCES:
patent: 5467020 (1995-11-01), Boyette et al.
patent: 5953306 (1999-09-01), Yi

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