Process for producing a strong bond between copper layers and ce

Coating processes – Spray coating utilizing flame or plasma heat – Nonuniform or patterned coating

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427455, 427309, 427350, 4273833, 4273835, C23C 408

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active

056481233

DESCRIPTION:

BRIEF SUMMARY
This is a national stage application of PCT/EP93/00675, filed Mar. 19, 1993.


BACKGROUND OF THE INVENTION

1. Field of the Invention
The invention relates to a process for producing a strong bond between copper layers, which have been applied by means of thermal spraying of pulverulent copper or copper alloys, and ceramic.
2. Description of Related Art
The bonding of copper as highly electrically conductive metal to oxide ceramic as readily thermally conductive insulator is of particular industrial importance in the field of electronic components. The copper layer is used as strip-conductor layer, electrode layer, sensor layer or else as connecting layer in the soldering of oxide ceramic as heat sink onto other components which develop a particularly high amount of heat.
Various processes are already known for the direct application of copper to ceramic. DE-A-38 24 249 describes, for example, deposition without external current after prior toughening of the ceramic surface and the subsequent palladium nucleation with subsequent heat treatment. This process has the disadvantage of allowing only metal layers having a maximum thickness of up to 5 .mu.m.
DE-A-30 36 128 describes the direct copper bonding process (DCB), in which a copper sheet having a thickness of from 100 to 900 .mu.m is applied to the ceramic surface at a temperature of about 1070.degree. C. The DCB process is, however, only economic if layers having thicknesses of more than 100 .mu.m are to be applied.
A base metallization by means of cathode atomization in vacuo or as described in DE-A-28 24 249 and subsequent electrolytic deposition of copper can be economically carried out for a layer thickness of up to a maximum of 50 .mu.m. The bond strength between the applied layer and the ceramic material can be, in the case of cathode atomization, increased by a so-called coupling layer of chromium, titanium, inter alia, but this coupling layer leads to considerable disadvantages in the further processing of the strip conductors by etching.
Application of copper by sputtering in a vacuum chamber with a prior plasma etching process in the same vacuum chamber is economically possible only up to a layer thickness of from 1 to 2 .mu.m.
In thermal spraying, it is known that copper can be applied both to metallic and to nonmetallic materials. Uses of such coatings are the improvement of the contact resistance or the application of solderable compounds and the like to the materials. The layers thus applied have, owing to the oxidation of the copper during the application process, a high electrical resistance in comparison to pure electrolytic copper. The various thermal spraying processes in vacuo or in chambers of protective gas are technically very complicated and can hardly be economically used in mass production, having regard to the component geometry of the electronic components.
In addition, the exceptionally high dimensional accuracy of the surface geometry required in modern high technology is only possible by means of further costly mechanical treatment in the known process steps, for some parts it cannot be achieved at all.


SUMMARY OF THE INVENTION

It is therefore an object of the invention to apply copper or copper alloys to ceramic components by thermal spraying in such a way that a simple process enables production of sufficiently strongly bonded layers having any desired thickness in the broad range of 5 .mu.m-300 .mu.m and having an electrical conductivity close to that of electrolytic copper, which layers also simultaneously have a low variation in thickness.
This object is achieved by a process of the generic type mentioned in the introduction, whose distinguishing feature is that a fine copper powder having a mean particle diameter of .ltoreq.20 .mu.m is applied to the ceramic surface by means of thermal spraying.


BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 schematically illustrates the coating process of the present invention.


DETAILED DESCRIPTION

Ceramic materials which have been found to be suitable according to the invention

REFERENCES:
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patent: 4505418 (1985-03-01), Neidig et al.
patent: 4609408 (1986-09-01), Rodrigues et al.
patent: 4921721 (1990-05-01), Matsui et al.
patent: 5005557 (1991-04-01), Baechli
patent: 5009218 (1991-04-01), Baechli
patent: 5058799 (1991-10-01), Zsamboky
patent: 5183553 (1993-02-01), Tenbrink et al.
patent: 5290606 (1994-03-01), Hestevik et al.
Thermal Spraying Handbook, Daily Industrial the Japanese Melt-Spraying Association issued May 31, 1964, p. 317.
Thermal Spraying Engineering issued on May 20, 1969, pp. 85 and 68.
Patent Abstracts of Germany, (Sep. 15, 1988), abstract of Bachli, "Heat Insulating Construction Or Lighting Element With Sealed Wall Elements Forming Evacuated Interspace, Useful For Double Or Triple Glazed Windo, Solar Collector, etc.", German No. 3684600.
Patent Abstract of Soviet, (Jan. 22, 1992), "Coating Of Metals And Alloys With Powders-Using High Velocity Gas Powder Stream With Improved Efficiency And Productivity", Week 9148.

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