Process for producing a silicon oxide deposit on the surface of

Details Process for producing a silicon oxide deposit on the surface of Process for producing a silicon oxide deposit on the surface of

1995-03-10

1996-06-04

Utech, Benjamin

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427535, 427536, 427537, 427539, 427574, 427579, B32B 2106

Patent

active

055231241

ABSTRACT:
A process for producing a silicon oxide deposit at the surface of a metallic substrate comprising the following steps performed either concomitantly or successively: (1) treating the surface of the substrate with a corona discharge; and (2) exposing the surface to an atmosphere containing a silicon compound in the gaseous state. Both steps (1) and (2) are conducted at a pressure greater than 10,000 Pa. This process can be used to provide anti-corrosion treatment to a metallic substrate or to a metallized polymeric support.

REFERENCES:
patent: 3655438 (1972-04-01), Sterling et al.
patent: 4792460 (1988-12-01), Chu et al.
patent: 4869929 (1989-09-01), Cabrera et al.
patent: 5185132 (1993-02-01), Horiike et al.
patent: 5225659 (1993-07-01), Kusano et al.
patent: 5275665 (1994-01-01), Okazaki et al.
patent: 5319247 (1994-06-01), Matsuura
Bunshah, R. F. et al., Deposition Technologies for Films and Coatings, Noyes Publications (1982) p. 506.

Affiliated with

Also associated with

Rating

Process for producing a silicon oxide deposit on the surface of does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for producing a silicon oxide deposit on the surface of , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing a silicon oxide deposit on the surface of will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-381969