Process for producing a SiC semiconductor device

Fishing – trapping – and vermin destroying

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437 41, 437 32, H01L 21265

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049668609

ABSTRACT:
A process for producing a SiC semiconductor device comprising growing a single-crystal film of SiC on a single-crystal substrate of Si and forming the structure of semiconductor device such as diodes, transistors, etc., on said SiC single-crystal film, thereby obtaining a SiC semiconductor device on a commercial scale.

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Nishino et al., "Blue-Emitting Diodes of 6H-SiC Prepared by Chemical Vapor Deposition", Japanese Journal of Applied Physics, vol. 19, No. 7, Jul. 1980, pp. L353-L356.
Matsunami et al., "Heteroepitaxial Growth of --SiC on Silicon Substrate Using SiCl.sub.4 --C.sub.3 --H.sub.8 --H.sub.2 System", Journal of Crystal Growth, vol. 42, 1978, pp. 138-143.
Nishino et al., "Production of Large-Area Single-Crystal Wafers of Cubic SiC for Semiconductor Devices", Applied Physics Letter, vol. 42, No. 5, Mar. 1983, pp. 460-462.

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