Process for producing a protective film on magnesium containing

Coating processes – Coating by vapor – gas – or smoke – Metal coating

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

427250, 4272553, 4272557, 427353, 427405, 4274192, C23C 1612, C23C 1640, C23C 1646, C23C 1656

Patent

active

049802038

ABSTRACT:
A process for producing a protective film on a magnesium based metallic substrate comprising producing successive deposits by vapor phase chemical deposition of at least one intermediate layer of metallic aluminum, and at least one surface layer of metallic oxide, and for the intermediate aluminum layer using a precursor chosen of triisobutylaluminum, heating the substrate to a temperature between 250.degree. C. and 320.degree. C., and for the surface layer selecting an appropriate precursor, heating the substrate to an appropriate temperature and introducing the precursor vapor to produce a protective film having a high surface hardness and strong adherence to the magnesium based substrate with high inertness in the electrochemical series, and forming an effective protection under both static and dynamic conditions.

REFERENCES:
patent: 2784486 (1957-03-01), Langer et al.
patent: 2847320 (1958-08-01), Bulloff
patent: 2867546 (1959-01-01), MacNevin
patent: 2982016 (1961-05-01), Drummond
patent: 4395437 (1983-07-01), Knapp
patent: 4659629 (1987-04-01), Gartner et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for producing a protective film on magnesium containing does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for producing a protective film on magnesium containing , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing a protective film on magnesium containing will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1161804

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.