Process for producing a perovskite film by irradiating a target

Details Process for producing a perovskite film by irradiating a target Process for producing a perovskite film by irradiating a target

1993-04-26

1995-03-07

Beck, Shrive

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427566, 427567, 427100, 4272553, B05D 512

Patent

active

053956630

ABSTRACT:
There is provided a process for producing a dielectric thin film of a perovskite oxide on a substrate by a vapor-deposition process which includes vaporizing the oxide and irradiating the oxide vapor or the substrate with a laser beam.
There is also provided a pyroelectric type of sensor comprising: a MOS element including a drain electrode, a source electrode, a gate electrode and an Si semiconductor and a film of a ferroelectric or pyroelectric material formed on the drain electrode, the drain electrode being made of a material which exhibits a good ohmic contact with Si or SiO.sub.2 and has a lattice constant close to that of ferroelectric or pyroelectric material.

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patent: 4902572 (1990-02-01), Horne et al.
patent: 5047385 (1991-09-01), Beasley et al.
B. D. Cullity, Elements of X-Ray Diffraction, Addison-Wesley, 1978 pp. 32-39.

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