Process for producing a multilayered thin ferroelectric film

Details Process for producing a multilayered thin ferroelectric film Process for producing a multilayered thin ferroelectric film

1996-02-05

1997-07-08

Utech, Benjamin

Coating processes

Electrical product produced

Metallic compound coating

427240, 4273762, 4274193, 4274198, 4274301, B05D 512

Patent

active

056458851

ABSTRACT:
The improved multilayered thin ferroelectric film includes a substrate, a first polycrystalline ferroelectric layer that is formed on the substrate, that has high density and a refractive index of the single-crystal grade but whose surface is not optically smooth, and a second polycrystalline ferroelectric layer that is formed on the first polycrystalline ferroelectric layer, that has a comparatively low density, that has a lower refractive index than the single crystal but which has an optically smooth surface. This multilayered thin ferroelectric film is produced by a process that comprises applying more than one coat of a solution of an organometallic compound to the substrate and performing more than one cycle of heat treatments, provided that firing for the formation of the first polycrystalline ferroelectric layer is conducted in a temperature range of 400.degree. to 1,000.degree. C. whereas firing for the formation of the second polycrystalline ferroelectric layer is conducted at a temperature in the range from 200.degree. to 600.degree. C. that is lower than the firing temperature used to form the first layer.

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