Process for producing a minute-patterned substrate

Details Process for producing a minute-patterned substrate Process for producing a minute-patterned substrate

1992-10-19

1993-08-10

Bell, Janyce

Coating processes

Nonuniform coating

Deforming the base or coating or removing a portion of the...

427162, 427278, 427294, 427359, 4273855, B05D 500

Patent

active

052347176

ABSTRACT:
Disclosed herein is a process for producing a minute-patterned substrate required for optical disk substrates for information recording or the like, which process comprises forming a coating film of a solution containing a metal-organic compound and a thickener on a substrate, pressing a mold against the coating film on the substrate under a reduced pressure and heating the coating film to set up the coating film, then removing the mold, and heating the set coating film on the substrate. By the process it is possible to provide the substrate surface with a minute rough pattern, without generation of surface defects arising from the pressing of the mold against the coating film, and to set up the coating film in a short time and with good dimensional accuracy. It is therefore possible to produce a rough surface pattern with high productivity.

REFERENCES:
patent: 3788872 (1974-01-01), Sigman
patent: 4250021 (1981-02-01), Greenaway
patent: 4382103 (1983-05-01), McQuaid
patent: 4931313 (1990-06-01), Arakawa et al.
patent: 5053252 (1991-10-01), Kimura et al.

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