Process for producing a mask

Details Process for producing a mask Process for producing a mask

2005-02-16

2008-08-12

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07410732

ABSTRACT:
In a process for producing a mask, layout data is provided for a semiconductor layout. The layout data is fractionated to create control data for a pattern generator. Slivers are identified slivers from the fractionating step. Second control data can be created from an enlarged imaging of the slivers. A first exposure can then be carried out using the control data and a second exposure can be carried out using the second data. The second exposure is carried out with a lower exposure dose as compared to the first exposure.

REFERENCES:
patent: 5366847 (1994-11-01), Powers
patent: 6281049 (2001-08-01), Lee
patent: 6968530 (2005-11-01), Schepp et al.

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