Process for producing a deposit of an inorganic and amorphous pr

Details Process for producing a deposit of an inorganic and amorphous pr Process for producing a deposit of an inorganic and amorphous pr

1992-07-09

1994-01-18

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Photoinitiated chemical vapor deposition

427584, 427582, 427581, 4272553, 4272552, B05D 306, C23C 1600

Patent

active

052798674

ABSTRACT:
A process for producing a deposit of an inorganic and amorphous protective coating on an organic polymer substrate, the coating comprising compounds in the form of an oxide, nitride, carbide, or alloys thereof, by photosensitized decomposition in the gas phase, which comprises decomposing a gas medium by photosensitized decomposition, including precursors of the elements constituting the deposit of the inorganic and amorphous protective coating to be produced by photonic excitation of an impurity which has been previously introduced into the medium, said decomposition being adapted for producing an indirect transfer of energy to the molecules of the medium, thereby causing the decomposition and subsequent deposition of the these elements onto the substrate.

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4EME Collogue International Sur Les Plasmas et la Pulverisation Cathodique, Nice, Sep. 13-17, 1982, pp. 95-98, Societe Francaise du Vide; B. Drevillon et al.: "Application de l'ellipsometrie spectroscopique rapide a l'etude de la formation de couches minces de silicium amorphe".
Japanese Journal of Applied Physics, vol. 24, No. 3, partie 1, Mar. 1985, pp. 274-278, Tokyo, JP; J. Takahashi et al.: "UV irradiation effects on chemical vapor deposition of SiO2". Figure 1, p. 274, right column, lines 11-15.

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