Process for preparing small particle size mixed metal oxides

Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing

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423600, C01B 1334

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active

050750909

ABSTRACT:
A process for preparing a particulate metal oxide of small particle size wherein a combustible organometallic compound alone or in admixture with a combustible organic liquid carrier is introduced into a combustion zone and combusted in a combustion supporting gas to produce particles of metal oxide, the combustion being carried out under reaction conditions so as to effect calcination of the metal oxide particles prior to condensation of the particles in the bulk phase.

REFERENCES:
patent: 4065544 (1977-12-01), Hamling et al.
patent: 4455289 (1984-06-01), Poe et al.
patent: 4529579 (1985-07-01), Raahauge
patent: 4610857 (1986-09-01), Ogawa et al.
patent: 4744974 (1988-05-01), Lewis et al.
Grant and Hackh's Chemical Dictionary, 5th Edition, McGraw-Hill, N.Y., 1987, page 147.
"Chemistry's New Workhorse", High Technology, Jul. 1987.
"Preparation of Very Pure, Finely Divided Aluminum Oxide from Triethyl Aluminum", by K. H. Thiele, W. Schwartz and L. Dettmann, Z. Anorg. Allgem. Chem., 349; 324-327 (1967).
"Fine Si.sub.3 N.sub.4 and SiC Powders Prepared by Vapor Phase Hydrolysis", presented at Conference on Ceramic Powder Science and Technology, Boston, Mass., Aug. 3-6, 1986.

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