Process for preparing silica or silica-based thick vitreous...

Details Process for preparing silica or silica-based thick vitreous... Process for preparing silica or silica-based thick vitreous...

2005-02-08

2005-02-08

Jones, Deborah (Department: 1775)

Chemistry of inorganic compounds

Silicon or compound thereof

Oxygen containing

C423S326000, C423S327100, C423S349000, C501S053000, C428S426000, C428S446000, C428S213000, C428S697000, C428S702000

Reexamination Certificate

active

06852300

ABSTRACT:
A sol-gel process allowing preparation, on a substrate, of glassy films of silicon oxide or mixed oxides based on silicon oxide, of thickness above 1 micrometer, generally between 2 and 20 micrometers and characterized by absence of defects, that turn out to be particularly suitable as waveguides in flat optical devices.

REFERENCES:
patent: 4801318 (1989-01-01), Toki et al.
patent: 4810415 (1989-03-01), Winkelbauer et al.
patent: 4966812 (1990-10-01), Ashley et al.
patent: 5047369 (1991-09-01), Fleming et al.
patent: 2-33888 (1990-02-01), None

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