Plastic and nonmetallic article shaping or treating: processes – Pore forming in situ – Including surface treatment of porous body
Reexamination Certificate
2003-03-03
2010-02-09
Fortuna, Ana M (Department: 1797)
Plastic and nonmetallic article shaping or treating: processes
Pore forming in situ
Including surface treatment of porous body
C264S041000, C264S049000, C210S500270, C210S490000, C210S500380
Reexamination Certificate
active
07658872
ABSTRACT:
The invention provides methods for preparing reverse osmosis membranes having improved permeability as well as membranes prepared by such methods.
REFERENCES:
patent: 3744642 (1973-07-01), Scala et al.
patent: 3855122 (1974-12-01), Bourganel
patent: 4005012 (1977-01-01), Wrasidlo
patent: 4256108 (1981-03-01), Theeuwes
patent: 4277344 (1981-07-01), Cadotte
patent: 4292417 (1981-09-01), Ishii et al.
patent: 4377654 (1983-03-01), Haas et al.
patent: 4619767 (1986-10-01), Kamiyama et al.
patent: 4765897 (1988-08-01), Cadotte et al.
patent: 4783346 (1988-11-01), Sundet
patent: 4812270 (1989-03-01), Cadotte et al.
patent: 4830885 (1989-05-01), Tran et al.
patent: 4948507 (1990-08-01), Tomaschke
patent: 4983291 (1991-01-01), Chau et al.
patent: 5152901 (1992-10-01), Hodgdon
patent: 5582725 (1996-12-01), McCray et al.
patent: 5658460 (1997-08-01), Cadotte et al.
patent: 5733602 (1998-03-01), Hirose et al.
patent: 5755964 (1998-05-01), Mickols
patent: 6245234 (2001-06-01), Koo et al.
patent: 6368507 (2002-04-01), Koo et al.
patent: 6913694 (2005-07-01), Koo et al.
patent: 0474370 (1992-03-01), None
Fortuna Ana M
GE Osmonics, Inc.
Viksnins Harris & Padys PLLP
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