Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Coating predominantly nonmetal substrate
Patent
1996-10-04
1998-08-25
Gorgos, Kathryn L.
Electrolysis: processes, compositions used therein, and methods
Electrolytic coating
Coating predominantly nonmetal substrate
205164, C25D 554, C25D 556
Patent
active
057980330
ABSTRACT:
A process for preparing a porous metallic body comprising the steps of: rendering a porous resin body electrically conductive, electroplating the conductive resin, and heating the electroplated resin to remove the resin, wherein the step of rendering the resin electrically conductive is conducted by coating the resin with a coating composition containing amorphous carbon particles as a conductive material. In the process, substantially spherical carbon particles may be used as the conductive material. The substantially spherical carbon particles are still preferably amorphous carbon. The thus obtained porous metallic body has reduced defect and more smooth skeleton in the porous body, is less likely to cause stress concentration upon application of bending and tensile force, has lower carbon content, and superior mechanical strength, and, therefore, the substrate is suitable as an electrode substrate for batteries.
REFERENCES:
patent: 5432031 (1995-07-01), Teraoka et al.
Dohi Tadashi
Furukawa Masayuki
Tsuchida Hitoshi
Uemiya Takafumi
Yamazaki Kazuo
Gorgos Kathryn L.
Nippon Graphite Industries Ltd.
Sumitomo Electric Industries Ltd.
Sumitomo Electric Industries Toyama Co., Ltd.
Wong Edna
LandOfFree
Process for preparing porous metallic body and porous metallic b does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for preparing porous metallic body and porous metallic b, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for preparing porous metallic body and porous metallic b will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-34117