Process for preparing polysiloxane microspheres with a narrow si

Details Process for preparing polysiloxane microspheres with a narrow si Process for preparing polysiloxane microspheres with a narrow si

1997-06-30

1998-09-01

Shaver, Paul F.

Organic compounds -- part of the class 532-570 series

Organic compounds

Silicon containing

528 10, 528 12, 528 16, C07F 708

Patent

active

058012621

ABSTRACT:
The present invention relates to a process to prepare polysiloxane microspheres with narrow size distribution having a particle size in the range of about 0.5 microns to about 10 microns. The first step involves combining, by weight, an optional anionic surfactant, a polymeric stabilizer, an hydroxide base, and water to form a first aqueous mixture to which is added a silane monomer to form a second aqueous mixture. The second aqueous mixture is then stirred at a temperature of from about 5.degree. C. to about 90.degree. C. for at least about 1 hours to form an aqueous dispersion comprising polysiloxane microspheres. The polysiloxane microspheres upon separation may be optionally washed with water and optionally dried at a temperature of up to about 300.degree. C. The polysiloxane microspheres can be further optionally jet treated to yield polysiloxane microspheres with a narrow size distribution having a particle size in the range of about 0.5 microns to about 10 microns.

REFERENCES:
patent: 4528390 (1985-07-01), Kimura
patent: 4871616 (1989-10-01), Kimura et al.
patent: 5247043 (1993-09-01), Nakashima
patent: 5412053 (1995-05-01), Lichtenhan et al.
patent: 5589562 (1996-12-01), Lichtenhan et al.

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