Process for preparing p-n junctions having a p-type ZnO film

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C117S008000, C428S642000, C438S046000

Reexamination Certificate

active

07033435

ABSTRACT:
A process for preparing p-n or n-p junctions having a p-type oxide film is disclosed. In one embodiment, a p-type zinc oxide film has a net acceptor concentration of at least about 1015acceptors/cm3.

REFERENCES:
patent: 3713822 (1973-01-01), Kiess
patent: 3728784 (1973-04-01), Schmidt
patent: 3728785 (1973-04-01), Schmidt
patent: 3801384 (1974-04-01), Schmidt
patent: 4626322 (1986-12-01), Switzer
patent: 5141564 (1992-08-01), Chen et al.
patent: 5248631 (1993-09-01), Park et al.
patent: 5274251 (1993-12-01), Ota et al.
patent: 5574296 (1996-11-01), Park et al.
patent: 5620557 (1997-04-01), Manabe et al.
patent: 5679965 (1997-10-01), Schetzina
patent: 5689123 (1997-11-01), Major et al.
patent: 5846844 (1998-12-01), Akasaki et al.
patent: 0 863 555 (1998-09-01), None
patent: WO 00/08691 (2000-02-01), None
Bagnall et al., Optically pumped lasing of ZnO at room temperature,Appl. Phys. Lett., Apr. 1997, pp. 2230-2232, vol. 70, No. 17.
Craciun et al., Growth of ZnO thin films on GaAs by pulsed laser deposition,Thin Solid Films, 1995, pp. 1-4.
Gunshor et al., Blue-green laser-diode technology moves ahead,Laser Focus World, Mar. 1995, pp. 97-100.
Hiramatsu et al., Transparent conducting ZnO thin films prepared by XeCI excimer laser ablation,J. Vac. Sci. Technol., Mar./Apr. 1998, pp. 669-673, vol. 16, No. 2.
Minegishi et al., Growth of p-type Zinc Oxide Films by Chemical Vapor Deposition,J. Appl. Phys., 1997, pp. 1453-1455, vol. 36, Pt. 2, No. 11A.
Joseph et al., p-Type Electrical Conduction in ZnO Thin Films by Ga and N Codoping,Jpn. J. Appl. Phys., Nov., 1999, pp. L1205-L1207, vol. 38, Part 2, No. 11A, Japanese Journal of Applied Sciences.
Mohammad et al., Reactive Molecular-Beam Epitaxy for Wurzite GaN,MRS Bulletin, Feb. 1997, pp. 22-28.
Nakamura, Blue-Green Light Emitting Diodes and Violet Laser Diodes,MRS Bulletin, Feb. 1997, pp. 29-35.
Ohtomo et al., MgxZn1−xas a II-VI widegap semiconductor alloy,Appl. Phy. Lett., May 1998, pp. 2466-2468, vol. 72, No. 19.
Pearton et al., GaN and Related Materials for Device Applications,MRS Bulletin, Feb. 1997, pp. 17-21.
Ponce, Defects and Interfaces in GaN Epitaxy,MRS Bulletin, Feb. 1997, pp. 51-57.
Reynolds et al., Similarities In The Bandedge And Deep-Centre Photoluminescence Mechanisms of ZnO and GaN,Solid State Comm., 1997, pp. 643-646, vol. 101, No. 9.
Shur et al., GaN/AIGaN Heterostructure Devices: Photodetectors and Field-Effect Transistors,MRS Bulletin, Feb. 1997, pp. 44-50.
Zolper et al., Implantation and Dry Etching of Group-III-Nitride Semiconductors,MRS Bulletin.Feb. 1997, pp. 36-43.
International Search Report, PCT/US 99/17486.
International Search Report, PCT/US00/41952.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for preparing p-n junctions having a p-type ZnO film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for preparing p-n junctions having a p-type ZnO film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for preparing p-n junctions having a p-type ZnO film will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3541866

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.