Drug – bio-affecting and body treating compositions – Designated organic nonactive ingredient containing other... – Carboxylic acid ester
Patent
1992-01-23
1993-11-23
Russel, Jeffrey E.
Drug, bio-affecting and body treating compositions
Designated organic nonactive ingredient containing other...
Carboxylic acid ester
514785, 514844, 514847, 514938, 252351, 554148, 554213, 554219, 554223, 554227, A61K 748, A61K 4714, C09F 508, C09F 710
Patent
active
052644600
ABSTRACT:
A process for preparing a nonionic surfactant includes the steps of: cleaving at least one of the isopropylidene groups of an isopropylidene polyglycerol C.sub.6 -C.sub.22 -fatty acid or mono- or polyhydroxy fatty acid ester, by hydrolysis or ketal exchange, in the presence of acid, at a temperature in the range of about 20.degree. C. to about 100.degree. C., and at atmospheric, reduced or superatmospheric pressure, thereby regenerating hydroxyl groups on the polyglycerol; and recovering the resultant polyol ester nonionic surfactant. Such polyol ester surfactants are useful as emulsifiers, especially for preparing skin care or cosmetic formulations and paints and wood-preservation agents.
REFERENCES:
patent: 2022766 (1935-12-01), Harris
patent: 3936391 (1976-02-01), Gabby et al.
patent: 4035513 (1977-07-01), Kumano
patent: 4454113 (1984-06-01), Hemker
patent: 4539266 (1985-09-01), Miyazaki
patent: 4971721 (1990-11-01), Takahashi et al.
Soviet Inventions Illustrated, Section Ch., Week D18, SU 759-503, Tula Chem. Ind. Res.
Chemical Abstract, vol. 41, pp. 2391-2394 (1947).
Jakobson Gerald
Siemanowski Werner
Uhlig Karl-Heinz
Deutsche Solvay-Werke GmbH
Russel Jeffrey E.
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