Organic compounds -- part of the class 532-570 series – Organic compounds – Chalcogen in the nitrogen containing substituent
Reexamination Certificate
2006-10-03
2006-10-03
Habte, Kahsay (Department: 1624)
Organic compounds -- part of the class 532-570 series
Organic compounds
Chalcogen in the nitrogen containing substituent
C548S327500
Reexamination Certificate
active
07115736
ABSTRACT:
A novel process for preparing imidazopyran derivatives of the formula:wherein R1is halogen atom, hydrogen atom, C1to C3alkyl group, aryl group, or aryl group substituted by C1to C3alkyl group, by using dinitroimidazole and 2,3-epoxy-1-propanol as starting materials and being followed by five steps.
REFERENCES:
patent: 6087358 (2000-07-01), Baker et al.
patent: 97/01562 (1997-01-01), None
Krysztof Walczak et al., “Synthesis of Acyclic Nitroazole Nucleosides and Their Incorporation into Oligonucleotides, and Their Duplex and Triplex Formulation”, Helvetica Chimica Acta, vol. 87, pp. 469-478, XP002354143, Feb. 2004.
Sanzhong Luo et al., “Ytterbium Triflate Catalyzed Reactions of Epoxide with Nitrogen Heterocycles Under Solvent-Free Condition”, Synthetic Communications, vol. 33, No. 17, pp. 2989-2994, XP009057051, 2003.
Kelvin K. Ogilvie et al., “A general method for selective silylation of primary hydroxy groups in carbohydrates and related compounds”, Carbohydrate Research, vol. 115, pp. 234-239, XP002354144, 1983.
Theodora W. Greene et al., “Protective Groups in Organic Synthesis”, John Wiley & Sons, Inc., pp. 86-119, XP002354152, 1991.
Orita Akihiro
Otera Junzo
Daiso Co. Ltd.
Habte Kahsay
Wenderoth , Lind & Ponack, L.L.P.
LandOfFree
Process for preparing imidazopyran derivatives does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for preparing imidazopyran derivatives, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for preparing imidazopyran derivatives will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3668747