Process for preparing disilane from monosilane by electric disch

Details Process for preparing disilane from monosilane by electric disch Process for preparing disilane from monosilane by electric disch

1994-03-07

1995-12-26

Niebling, John

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

204164, H05F 300

Patent

active

054784530

ABSTRACT:
A process for producing disilane from monosilane comprising introducing monosilane into a reaction zone in which the monosilane is subjected to an electric discharge generated by a high frequency current. The monosilane is mixed with at least one inert gas selected from the group consisting of helium and argon. The pressure of the gaseous mixture in the reaction zone is between 0.1 and 3 bar, and the gaseous mixture is contacted in the reaction zone under electric discharge with a wall cooled to a temperature which is sufficiently low for the saturation vapor pressure of the disilane to be negligible, but not low enough for the monosilane to condense at the working partial pressure. Apparatus for conducting this process is provided.

REFERENCES:
patent: 4568437 (1986-02-01), Dickson
patent: 4792460 (1988-12-01), Chu et al.
Two abstracts corresponding to JP-A-61 106 411 of 24 May 1986.

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