Process for preparing cuprous aluminum tetrahalide complexing ag

Details Process for preparing cuprous aluminum tetrahalide complexing ag Process for preparing cuprous aluminum tetrahalide complexing ag

1977-05-02

1978-07-11

Sneed, Helen M. S.

Chemistry of carbon compounds

Miscellaneous organic carbon compounds

C-metal

423463, 423464, 423493, C07F 108

Patent

active

041001834

ABSTRACT:
Cuprous aluminum tetrahalide complexing agents are prepared from cuprous halide such as cuprous chloride contaminated with cupric halide by a method which reduces the cupric ion to the cuprous ion by treating the contaminated cuprous halide with an organo metal compound, such as metal alkyls, metal alkyl halide or metal alkoxides such as diethyl aluminum chloride prior to preparation of the complexing agent by reacting the cuprous halide with an aluminum trihalide such as aluminum trichloride. The pretreatment to remove the cupric ions reduces the amount of aromatic tars formed in processes employing the complexing agents.

REFERENCES:
patent: 3143542 (1964-08-01), Ziegler et al.
patent: 3440296 (1969-04-01), Walker
patent: 3592865 (1971-07-01), Long et al.
patent: 3647843 (1972-03-01), Walker et al.
patent: 3651159 (1972-03-01), Long et al.
patent: 3754047 (1973-08-01), Long et al.
patent: 3755487 (1973-08-01), Jahnig et al.
patent: 3758606 (1973-09-01), Horowitz et al.
patent: 3767725 (1973-10-01), Walker et al.
patent: 3845188 (1974-10-01), Walker
patent: 3857869 (1974-12-01), Turnbo
Chemical Abstracts, 82, 25290a (1975).
Chemical Abstracts, 77, 113556u (1972).

Affiliated with

Also associated with

Rating

Process for preparing cuprous aluminum tetrahalide complexing ag does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for preparing cuprous aluminum tetrahalide complexing ag, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for preparing cuprous aluminum tetrahalide complexing ag will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-261872