Process for preparing cefdinir

Details Process for preparing cefdinir Process for preparing cefdinir

2006-09-12

2006-09-12

Berch, Mark L. (Department: 1624)

Organic compounds -- part of the class 532-570 series

Organic compounds

Heterocyclic carbon compounds containing a hetero ring...

Reexamination Certificate

active

07105659

ABSTRACT:
The present invention relates to a novel process for the preparation of a cefdinirby reacting O-acetyl thioester of Formula Iwithin the presence of a base in suitable solvent wherein R′ represents H or any carboxyl protecting group, and then converting to the cefdinir by the removal of protecting groups. This invention also relates to making the cefdinir using a novel process to prepare the O-acetyl thioester intermediate (Formula I) by condensing (Z)-2-(2-amino-4-thiazolyl)-2-acetyloxyiminoacetic acid with bis(benzothiazol-2-yl)disulphide in the presence of triphenylphosphine and a base in a suitable solvent.

REFERENCES:
patent: 4888429 (1989-12-01), Hebeisen
patent: 5523400 (1996-06-01), Wei et al.
patent: 6878827 (2005-04-01), Ono et al.
patent: 2003/0204082 (2003-10-01), Manca et al.
patent: 2004/0210049 (2004-10-01), Lee et al.
patent: 2004/0242556 (2004-12-01), Dandala et al.
patent: 2005/0080255 (2005-04-01), Kumar et al.
patent: 2005/0137182 (2005-06-01), Dandala et al.
patent: 2006/0025586 (2006-02-01), Kremminger et al.
patent: 59-184186 (1984-10-01), None
patent: 02000790 (1990-01-01), None
patent: WO 0179211 (2001-01-01), None
patent: WO 2004016623 (2004-02-01), None
Translation of WO0179211 A1.
Lin, Hecheng Huaxue 9(5) 383-385 2001 and translation.
Translation of JP 02000790 A2.

Affiliated with

Also associated with

Rating

Process for preparing cefdinir does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for preparing cefdinir, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for preparing cefdinir will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3590065