Process for preparing aromatic polymers in presence of alkali me

Chemistry of carbon compounds – Miscellaneous organic carbon compounds

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

260 49, 260 63K, 260 63HA, 260 79, 260 793M, 260823, C08G 6538, C08G 6540, C08G 7520

Patent

active

039417484

ABSTRACT:
An aromatic polymer comprising recurring units having the formula --Ar--Q-- is made by a new process which comprises heating an alkali metal fluoride with an activated halophenol of the formula X--Ar--QH and/or a substantially equimolar mixture of an activated dihalobenzenoid compound of the formula X--Ar--X and a dihydric phenol of the formula HQ--Ar--QH in which formulae Ar and Q are respectively a bivalent aromatic residue and an oxygen or sulphur atom and may vary from unit to unit in the polymer chain and X is a halogen atom, the amount of alkali metal fluoride being such that together with any of the X atoms that are fluorine the total number of fluorine atoms in the reaction system is at least twice the number of --QH groups in the system.

REFERENCES:
patent: 3634355 (1972-01-01), Barr et al.
Ingold, Structure and Mechanism in Organic Chemistry, Cornell Univ. Press, Ithica, N.Y., 1953 (p. 71).
Hine, Physical Organic Chemistry, 2d ed., McGraw-Hill, N.Y. 1962 (pp. 85-87).
Lavrischev et al, (Russian) J. Gen. Chem. 30, 3037-3044(1960).
Vorozhtsov et al, (Russian) J. Gen. Chem. 28, 40-44(1958).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for preparing aromatic polymers in presence of alkali me does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for preparing aromatic polymers in presence of alkali me, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for preparing aromatic polymers in presence of alkali me will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1277235

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.