Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Compositions to be polymerized by wave energy wherein said...
Patent
1994-10-07
1995-06-27
Berman, Susan W.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Compositions to be polymerized by wave energy wherein said...
522111, 522164, 522162, 424 7832, 424 7835, A61K 3174, C08J 328
Patent
active
054280788
DESCRIPTION:
BRIEF SUMMARY
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to certain polymeric materials having substantially modified surfaces which are inherently antimicrobial. The invention also relates to selective irradiation and chemical reducing processes for preparing the antimicrobial materials of the invention, methods of using such antimicrobial materials to control microorganisms, and products and devices comprising such antimicrobial materials.
2. Description of the Prior Art
Although there is no disclosure of imparting antimicrobial properties, laser irradiation of fibers, yarns, and nonwoven materials is known. PCT. Application WO 87/03021, published May 5, 1987, discloses the irradiation of such materials to form depressions and elevations on the surface which improves the material's adhesiveness, frictional resistance and absorptive capacity.
Polyamide materials can also be irradiated with electron energy or treated chemically for grafting purposes, or for improving certain mechanical properties. United Kingdom Patent, 1,078,457, discloses treating polyamide materials with stabilizers such as sodium and potassium borohydride for protecting the materials from discoloration and loss of mechanical strength when exposed to heat or light. Nablo, U.S. Pat. No. 3,774,706, discloses a process of using substantially monochromatic, short-period, high intensity electron beams at a dosage rate considerably in excess of 10.sup.7 rads/second to bulk-sterilize a wide range of substances. Nablo, U.S. Pat. No. 4,211,622, discloses using electron energy to graft phosphorous or halogen-rich double bonded molecules into materials such as nylon in order to impart flame retardant properties. Tamura et al., U.S. Pat. No. 4,291,142, discloses crosslinked aromatic polyamide films which may be crosslinked by means of heat, ultraviolet (UV) rays, or electron beams. The crosslinked film shows an increased resistance to thermal decomposition. Calcaterra et al., U.S. Pat. No. 4,810,567, discloses a class of antimicrobial fabrics having one or more antimicrobial agents covalently bonded to a graft copolymer of the fabric. The graft copolymer may be formed by electron beam irradiation of a fabric impregnated with a vinyl monomer.
It is also known that antimicrobial properties can be imparted to certain types of acrylic polymers, fibers and fabrics. Pardini, U.S. Pat. No. 4,708,870, discloses an antimicrobial composition of a) at least 85% by weight acrylonitrile, b) up to about 13% by weight of a neutral ethylenically unsaturated monomer, and c) from-about 0.1 to 10% by weight of a protonated amine containing compound. The composition is formed by copolymerization of the acrylic protonated amine comonomer and/or by use of protonated amine end groups.
In accordance with the present invention, it has now been discovered that certain polymeric materials having substantially modified surfaces are antimicrobial. It has also been discovered that selective ultraviolet (UV) photon irradiation, electron irradiation, or chemical reducing agents can impart this property to the polymeric material.
SUMMARY OF THE INVENTION
The present invention relates to certain polymeric materials having substantially modified surfaces which are inherently antimicrobial. These antimicrobial materials include natural and synthetic polyamides, polyureas, polyhydrazides, polyurethanes and copolymers and blends thereof. Each of these materials has a surface containing a sufficient amount of corresponding functional groups, amines and/or hydrazines, to impart antimicrobial activity to the surface.
The antimicrobial, polymeric materials of this invention may be formed by the following methods:
This invention also relates to such irradiation and chemical reduction processes for forming antimicrobial, polymeric materials. Preferably, the UV photons have a wavelength of no greater than 222 nm with an energy density of at least 300 mJ/cm.sup.2. Sources of suitable UV photon irradiation include lasers and UV lamps. For electron irradiation, ele
REFERENCES:
patent: 4291142 (1981-09-01), Tamura et al.
patent: 4708870 (1987-11-01), Pardini
patent: 4810567 (1989-03-01), Calcaterra et al.
Cohen Jeffrey D.
Erkenbrecher, Jr. Carl W.
Haynie Sharon
Kelley Michael J.
Kobsa Henry
Berman Susan W.
E. I. Du Pont de Nemours and Company
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