Process for preparing alumina particulates, at least a fraction

Chemistry of inorganic compounds – Oxygen or compound thereof – Metal containing

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423625, 423631, 423630, C01F 702

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active

043449280

ABSTRACT:
Aqueous suspensions of alumina particulates, at least a portion of which comprising ultrafine boehmite, are prepared by maintaining a pH<9 aqueous formulation of poorly crystallized and/or amorphous activated alumina powder for such period of time as to effect the at least partial transformation of such alumina powder into ultrafine boehmite.

REFERENCES:
patent: 1953201 (1934-04-01), Tosterud
patent: 2915475 (1959-12-01), Bugosh
patent: 3031418 (1962-04-01), Bugosh
patent: 3222129 (1965-12-01), Osment et al.
patent: 3226191 (1965-12-01), Osment et al.
patent: 3268295 (1966-08-01), Armbrust et al.
patent: 3408160 (1968-10-01), Schmidt et al.
patent: 3608060 (1971-09-01), Williams et al.
patent: 3628914 (1971-12-01), Graulier
patent: 3714343 (1973-01-01), Sato et al.
patent: 3874889 (1975-04-01), Geppert et al.
patent: 3919117 (1975-11-01), Michalko
patent: 3928236 (1975-12-01), Rigge et al.
patent: 4001144 (1977-01-01), Pearson et al.
patent: 4117105 (1978-09-01), Hertzenberg et al.
patent: 4120942 (1978-10-01), Spitzer et al.
patent: 4124699 (1978-11-01), Michel et al.
patent: 4186178 (1980-01-01), Oherlandrer
patent: 4191737 (1980-03-01), Ilwine

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