Coating processes – Coating by vapor – gas – or smoke – Base includes an inorganic compound containing silicon or...
Patent
1997-03-26
1998-11-24
Beck, Shrive P.
Coating processes
Coating by vapor, gas, or smoke
Base includes an inorganic compound containing silicon or...
4272552, C23C 1638
Patent
active
058403671
ABSTRACT:
A chemical vapor deposition process comprising reacting HfCl.sub.4 with Bsub.3 and SiCl.sub.4 with BCl.sub.3 on a surface heated at 1100.degree. C. to 1300.degree. C. in a vacuum to produce a two phase HfB.sub.2 -SiB.sub.4 ceramic coating on the surface, wherein the HfCl.sub.4, SiCl.sub.4, and BCl.sub.3 reactants are deposited onto the heated surface from a vapor phase, and wherein H.sub.2 is used to dissociate the HfCl.sub.4, SiCl.sub.4 and BCl.sub.3 molecules.
REFERENCES:
patent: 3979500 (1976-09-01), Sheppard et al.
patent: 4022872 (1977-05-01), Carson et al.
patent: 5149514 (1992-09-01), Sanjuro
Beck Shrive P.
Forrest John
Johnson Roger D.
Meeks Timothy
The United States of America as represented by the Secretary of
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