Process for preparing a titanium carbide film

Details Process for preparing a titanium carbide film Process for preparing a titanium carbide film

1983-08-16

1986-04-15

Childs, Sadie L.

Coating processes

Coating by vapor, gas, or smoke

Carbon or carbide coating

4272552, C23C 1100, C23C 1300

Patent

active

045827281

ABSTRACT:
A process for preparing a titanium carbide film characterized by vaporizing metallic titanium from a metallic titanium vaporizing source placed in an atmosphere containing a dilute acetylene gas and depositing titanium carbide onto the surface of base set up facing said source.

REFERENCES:
patent: 3369924 (1968-02-01), Bourdeau et al.
patent: 3642522 (1972-02-01), Gass et al.
Sedgwick et al, Proceedings of the Seventh International Conference on Chemical Vapor Deposition, pp. 480-481, 1979.
Bunshah et al, "Activated Reactive Evaporation Process for High Rate Deposition of Compounds", J. Vac. Sci. Tech., vol. 9, No. 6, 1972, pp. 1385-1388.
Raghuram et al, "The Effect of Substrate Temperature on the Structure of Titanium Carbide Deposited by Activated Reactive Evaporation", J. Vac. Sci. Tech., vol. 9, No. 6, pp. 1389-1394, 1972.

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