Catalyst – solid sorbent – or support therefor: product or process – Catalyst or precursor therefor – Halogen or compound containing same
Patent
1987-06-18
1989-09-05
Shine, W. J.
Catalyst, solid sorbent, or support therefor: product or process
Catalyst or precursor therefor
Halogen or compound containing same
B01J 2728, B01J 2713
Patent
active
048638900
ABSTRACT:
Process for preparing a ruthenium promoted, halogen-containing, nickel and/or cobalt catalyst includes impregnating, in one or more steps, a porous metal oxide support with a nickel compound and/or a cobalt compound, and a ruthenium compound to form a catalyst intermediate; reducing the nickel compound and/or cobalt compound, and ruthenium compound, in one or more steps, to the respective metal by reacting the catalyst intermediate with hydrogen gas at an elevated temperature sufficient to reduce the respective compounds to the metal; and introducing halogen by adding a halide compound at any stage in the process. Catalyst prepared by the above process and use thereof.
REFERENCES:
patent: 1449423 (1923-03-01), Lowy et al.
patent: 2365721 (1944-12-01), Olin et al.
patent: 2666756 (1954-01-01), Boyd et al.
patent: 3278598 (1966-10-01), Markiewitz
patent: 3595932 (1971-07-01), Maslyansky et al.
patent: 3766184 (1973-10-01), Johansson et al.
patent: 3896173 (1975-07-01), Drake
patent: 4097368 (1978-06-01), Hayes
patent: 4115463 (1978-09-01), Murtha
patent: 4263175 (1981-04-01), Pesa et al.
patent: 4268699 (1981-05-01), Murtha et al.
patent: 4510320 (1985-04-01), Pesa et al.
Berol Kemi AB
Shine W. J.
LandOfFree
Process for preparing a ruthenium-promoted, halogen-containing n does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for preparing a ruthenium-promoted, halogen-containing n, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for preparing a ruthenium-promoted, halogen-containing n will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-243423