Process for preparing a positive resist composition by mixing th

Details Process for preparing a positive resist composition by mixing th Process for preparing a positive resist composition by mixing th

1989-12-05

1992-01-14

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430192, 430193, 430169, 528482, 528499, 528501, G03F 7022

Patent

active

050809970

ABSTRACT:
A process for preparing a positive resist composition, which process includes the steps of condensation reacting a quinone diazide sulfonyl halogenide with a phenol compound, mixing a condensation reaction mixture with a solution of an alkali-soluble resin in a resist solvent and removing impurities from the mixture, whereby the overall processing time can be shortened.

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patent: 4696886 (1987-09-01), Hanabata et al.
patent: 4719167 (1988-01-01), Miura et al.
patent: 4731319 (1988-03-01), Kohara et al.
patent: 4859563 (1989-08-01), Miura et al.
patent: 4863828 (1989-09-01), Kawabe et al.
patent: 4871645 (1989-10-01), Uenishi et al.

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