Process for preparing a polishing composition

Details Process for preparing a polishing composition Process for preparing a polishing composition

2006-06-30

2009-08-18

Marcheschi, Michael A (Department: 1793)

Abrasive tool making process, material, or composition

With inorganic material

Clay, silica, or silicate

C106S003000, C438S691000, C438S692000, C438S693000, C516S009000

Reexamination Certificate

active

07575615

ABSTRACT:
The present invention relates to a process for preparing a polishing composition comprising a colloidal silica prepared from a silicate. The first step involves adjusting the pH of a silica dispersion comprising colloidal silica, having an average particle size of primary particles of 1 nm or more and less than 40 nm, to a range of from 10 to 14. The second step involves re-adjusting the pH of the silica dispersion obtained in the first step to a range of from 1 to 6. A density of silanol groups is formed on the surface of the colloidal silica that is from 0.06 to 0.3 mmol per 1 g of the colloidal silica.

REFERENCES:
patent: 5226930 (1993-07-01), Sasaki
patent: 5352277 (1994-10-01), Sasaki
patent: 6139763 (2000-10-01), Ina et al.
patent: 2003/0041526 (2003-03-01), Fujii et al.
patent: 2168993 (1986-07-01), None
patent: 2001269857 (2001-10-01), None
English Language Abstract of JP-A-2001-269857 (Oct. 2, 2001).

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