Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1990-09-10
1992-10-06
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
2642711, 264279, 430270, G03F 100
Patent
active
051530848
ABSTRACT:
A method for the preparation a photo-mask used for photo-imaging selected areas on the surfaces of a three-dimensional printed circuit board substrate. The photo-mask comprises a membrane transparent and degradation resistant to UV light, having at least one side with a contoured shape conforming, and flexible enough to comply with surface irregularities on the surfaces of the three-dimensional substrate being photo-imaged. A pattern of tracks opaque to UV light is positioned along the contoured shape of the membrane. The pattern of tracks on the photo-mask is in accordance with a desired conductive metal trace pattern on the surfaces of the three-dimensional printed circuit board substrate. The photo-mask is prepared by dispensing a track material in a boustrophedenous manner on the surfaces of the substrate being photo-imaged. A membrane material is then poured upon the surfaces containing the dispensed tracks. Once the materials of tracks and membrane set and are separated from the substrate, the photo-mask of the present invention is formed.
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Dumas William V.
Foust Donald Franklin
Karas Bradley R.
Lamby Edward J.
Angebranndt M.
Bowers Jr. Charles L.
Deshmukh Sudhir G.
General Electric Company
Pittman William H.
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