Process for preparing a monomolecular built-up film

Details Process for preparing a monomolecular built-up film Process for preparing a monomolecular built-up film

1989-09-05

1992-03-03

Beck, Shrive

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 36, 427 38, 427 541, 427333, 427 44, 4274432, B05D 306

Patent

active

050931547

ABSTRACT:
A process for producing a monomolecular built-up film of monomolecular layers of a silane surfactant is described. In the process, the silane surfactant is chemically adsorbed on a hydrophilic surface of a substrate and is subjected to irradiation of a high energy beam or plasma treatment in an active gas atmosphere to activate the monomolecular layer. This activated layer is further adsorbed with the silane surfactant to form a built-up film. The beam irradiation or plasma treatment may be effected in a desired pattern. The beam irradiation or plasma treatment and the further adsorption are repeated until the desired number of the monomolecular layers is obtained.

REFERENCES:
patent: 4539061 (1985-09-01), Sagiv
patent: 4761316 (1988-08-01), Ogawa
patent: 4778724 (1988-10-01), Bragole
patent: 4968524 (1990-11-01), Ogawa et al.
patent: 4992300 (1991-02-01), Ogawa et al.
patent: 5008127 (1991-04-01), Ogawa

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