Process for preparing a mask for use in manufacturing a semicond

Details Process for preparing a mask for use in manufacturing a semicond Process for preparing a mask for use in manufacturing a semicond

1975-09-15

1978-01-10

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

96 383, 427 43, B05D 306

Patent

active

040680185

ABSTRACT:
A process is disclosed for preparing a mask, such as a photo-mask, used in a selective etching process in the manufacture of a semiconductor device or a protective mask for use in a process for selectively providing a porous layer of silicon or for anodic oxidation of a metal layer, in which ions accelerated at a predetermined voltage are implanted into a photo-resist film to a predetermined dose level.

REFERENCES:
patent: 3467523 (1969-09-01), Seidel et al.
Kleinfelder, "IBM Technical Disclosure Bull.," vol. 14, No. 10, Mar. 1972, p. 2899.

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